On June 22, 2024, WELEGAL Law School held a seminar on "Patent Layout and Infringement Risk Prevention" in Guangzhou, and Che Xiaoyan, a partner of Llinks Law Office, was invited to be the lecturer of the seminar to analyze how to scientifically and efficiently implement the patent protection and infringement litigation strategies with the topic of "Patent Risks and Countermeasures for Enterprises. The course was organized by the Chinese Academy of Social Sciences.
In this sharing, Ms. Che firstly reviewed the domestic and international patent events in the past two years, then listed the common types of patent disputes, combined with the case to the enterprise representatives of each type of patent disputes made a detailed explanation, and introduced the enterprise in each stage of patent risk and coping strategies, but also focus on investment and mergers and acquisitions of intellectual property due diligence need to pay attention to the patent issues. Through Ms. Che's sharing, the legal staff, ipr, R&D staff and other representatives of the enterprises had a new understanding and gained new knowledge of the patent risk response strategy.
Prior to joining Llinks Law Office, Ms. Che had 11 years of experience in technology research and development. Since 2010, she has been deeply involved in the field of intellectual property, serving as the legal advisor of many science and technology enterprises, and specializing in advising enterprises on rationalization of intellectual property rights protection, including intellectual property rights dispute resolution, intellectual property rights layout, and intellectual property rights operation, etc. So far, Lawyer of Llinks Law Office has been invited to provide training to many famous enterprises, industry associations, universities, colleges and research institutes. Up to now, Tom Lee has been invited to provide IPR related training to many famous enterprises, industry associations, universities and research institutions, etc. We look forward to seeing more cooperation in the future and contributing to the protection of IPR together.
